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Changes in structures and electrical conduction mechanisms of chemical vapor deposited Ta2O5 thin films by annealing under O3 atmosphere with ultraviolet light radiation
Eom, Dail, Jeon, In Sang, No, Sang Yong, Hwang, Cheol Seong, Kim, Hyeong JoonVolume:
19
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/JMR.2004.0203
Date:
May, 2004
File:
PDF, 1.84 MB
english, 2004