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Complexing Between Additives and Ceria Abrasives Used for Polishing Silicon Dioxide and Silicon Nitride Films
Wang, Liangyong, Liu, Bo, Song, Zhitang, Liu, Weili, Feng, Songlin, Huang, David, Babu, S. V.Volume:
14
Year:
2011
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.3519883
File:
PDF, 212 KB
english, 2011