Low-k Dielectric Obtained by Noble Gas Implantation in Silicon Oxide
Assaf, Hanan, Ntsoenzok, E., Ruault, M-O., Ashok, S.Volume:
914
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0914-F03-04
Date:
January, 2006
File:
PDF, 3.85 MB
english, 2006