Pulsed DC Magnetron Sputtered Rutile TiO2 films for next...

Pulsed DC Magnetron Sputtered Rutile TiO2 films for next generation DRAM capacitors

Jithin, M.A, Kolla, Lakshmi Ganapathi, Bhat, Navakanta, Mohan, S., Morozumi, Yuichiro, Kaushal, Sanjeev
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Volume:
1561
Year:
2013
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/opl.2013.823
File:
PDF, 557 KB
english, 2013
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