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Physical properties of copper oxide thin films prepared by dc reactive magnetron sputtering under different oxygen partial pressures
Chun-Lung Chu, Hsin-Chun Lu, Chen-Yang Lo, Chi-You Lai, Yu-Hsiang WangVolume:
404
Year:
2009
Language:
english
Pages:
4
DOI:
10.1016/j.physb.2009.08.185
File:
PDF, 294 KB
english, 2009