Understanding of Boron Junction Stability in Preamorphized Silicon after Optimized Flash Annealing
Yeong, S. H., Colombeau, B., Poon, C. H., Mok, K. R. C., See, A., Benistant, F., Tan, D. X. M., Pey, K. L., Ng, C. M., Chan, L., Srinivasan, M. P.Volume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2917901
File:
PDF, 677 KB
english, 2008