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A Calculation Method of Deposition Profiles in Chemical Vapor Deposition Reactors Using Genetic Algorithms for The Automatic Modeling System of Reaction Mechanisms
Takahashi, Takahiro, Ema, YoshinoriVolume:
894
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-0894-LL03-10
Date:
January, 2005
File:
PDF, 106 KB
english, 2005