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Silicon nanocrystals in SiO2 matrix obtained by ion implantation under cyclic dose accumulation
V.A. Terekhov, S.Yu. Turishchev, V.M. Kashkarov, E.P. Domashevskaya, A.N. Mikhailov, D.I. Tetel’baumVolume:
38
Year:
2007
Language:
english
Pages:
5
DOI:
10.1016/j.physe.2006.12.030
File:
PDF, 254 KB
english, 2007