Control and Manipulation of Residual Gases during RF...

Key Engineering Materials 2001 Vol. 192-195

Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings

Love, E.R., Weimper, M., Boyd, A., Akay, M., Meenan, B.J.
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Volume:
192-195
Year:
2001
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.192-195.255
File:
PDF, 501 KB
2001
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