The Mechanism of Haze and Defectivity Reduction in a New Generation of High Performance Silicon Final Polishing Slurries
White, Michael L, Romine, Richard, Jones, Lamon, Ackerman, WilliamVolume:
1249
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1249-E03-03
Date:
January, 2010
File:
PDF, 728 KB
english, 2010