Low Temperature Plasmaless Etching of Silicon Dioxide Film Using Chlorine Trifluoride Gas with Water Vapor
Saito, Makoto, Kataoka, Yoshinori, Homma, Tetsuya, Nagatomo, TakaoVolume:
147
Year:
2000
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1394114
File:
PDF, 152 KB
english, 2000