Low Temperature Plasmaless Etching of Silicon Dioxide Film...

Low Temperature Plasmaless Etching of Silicon Dioxide Film Using Chlorine Trifluoride Gas with Water Vapor

Saito, Makoto, Kataoka, Yoshinori, Homma, Tetsuya, Nagatomo, Takao
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Volume:
147
Year:
2000
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1394114
File:
PDF, 152 KB
english, 2000
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