An upper limit of concentration for erbium...

Physics Letters A 2004 Vol. 327; Iss. 4

An upper limit of concentration for erbium photoluminescence from silica-based thin films formed by MEVVA implantation

Zhisong Xiao, Fei Xu, Guoan Cheng, Tonghe Zhang
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Volume:
327
Year:
2004
Language:
english
Pages:
5
DOI:
10.1016/j.physleta.2004.05.002
File:
PDF, 205 KB
english, 2004
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