X-ray reflectometry and spectroscopic ellipsometry characterization of Al2O3 atomic layer deposition on HF-last and NH3 plasma pretreatment Si substrates
Lu, Hong-Liang, Xu, Min, Ding, Shi-Jin, Chen, Wei, Zhang, David Wei, Wang, Li-KangVolume:
22
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/jmr.2007.0184
Date:
May, 2007
File:
PDF, 188 KB
english, 2007