Atomic Layer Deposition of Hafnium Oxide on Ge and GaAs Substrates: Precursors and Surface Preparation
Delabie, Annelies, Brunco, David P., Conard, Thierry, Favia, Paola, Bender, Hugo, Franquet, Alexis, Sioncke, Sonja, Vandervorst, Wilfried, Van Elshocht, Sven, Heyns, Marc, Meuris, Marc, Kim, Eunji, McVolume:
155
Year:
2008
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2979144
File:
PDF, 309 KB
english, 2008