Characterization of hydrogen environment anisotropic...

Japanese Journal of Applied Physics 2015 / 04 Vol. 54; Iss. 4

Characterization of hydrogen environment anisotropic thermal etching and application to GaN nanostructure fabrication

Kita, Ryo, Hachiya, Ryo, Mizutani, Tomoya, Furuhashi, Hiroki, Kikuchi, Akihiko
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Volume:
54
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.54.046501
Date:
April, 2015
File:
PDF, 597 KB
english, 2015
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