Surface Chemical Reaction Model of Silicon Dioxide Film Etching by Dilute Hydrogen Fluoride Using a Single Wafer Wet Etcher
Habuka, H., Mizuno, K., Ohashi, S., Kinoshita, T.Volume:
2
Language:
english
Journal:
ECS Journal of Solid State Science and Technology
DOI:
10.1149/2.013306jss
Date:
April, 2013
File:
PDF, 581 KB
english, 2013