Characterization of Ru thin films from a novel CVD/atomic...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2015 / 01 Vol. 33; Iss. 1

Characterization of Ru thin films from a novel CVD/atomic layer deposition precursor “Rudense” for capping layer of Cu interconnects

Maniwa, Atsushi, Chiba, Hirokazu, Kawano, Kazuhisa, Koiso, Naoyuki, Oike, Hiroyuki, Furukawa, Taishi, Tada, Ken-ichi
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Volume:
33
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4902560
Date:
January, 2015
File:
PDF, 1.04 MB
english, 2015
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