GaAs pHEMT-based technology for microwave applications in a volume MMIC production environment on 150-mm wafers
O'Keefe, M.F., Atherton, J.S., Bosch, W., Burgess, P., Cameron, N.I., Snowden, C.M.Volume:
16
Language:
english
Journal:
IEEE Transactions on Semiconductor Manufacturing
DOI:
10.1109/tsm.2003.815631
Date:
August, 2003
File:
PDF, 850 KB
english, 2003