Pattern transfer using poly(styrene-block-methyl...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2007 Vol. 25; Iss. 6

Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching

Liu, Chi-Chun, Nealey, Paul F., Ting, Yuk-Hong, Wendt, Amy E.
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Volume:
25
Year:
2007
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2801884
File:
PDF, 1.12 MB
english, 2007
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