Effects of Argon-Oxygen Ratio and Sputtering Power on...

Advanced Materials Research 2011 / 3 Vol. 216

Effects of Argon-Oxygen Ratio and Sputtering Power on Optical Properties of ZnO:Al Thin Films Fabricated by RF Magnetron Sputtering

Jie, Shu, Yang, Li, Fan, Dong Hua
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Volume:
216
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.216.307
Date:
March, 2011
File:
PDF, 545 KB
english, 2011
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