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High-Performance HfO[sub 2] Gate Dielectrics Fluorinated by Postdeposition CF[sub 4] Plasma Treatment
Wu, Woei Cherng, Lai, Chao Sung, Wang, Jer Chyi, Chen, Jian Hao, Ma, Ming Wen, Chao, Tien ShengVolume:
154
Year:
2007
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2733873
File:
PDF, 285 KB
english, 2007