Deposition Process and Property of Silica Films Containing...

Journal of Materials Research 1997 / 4 Vol. 12; Iss. 4

Deposition Process and Property of Silica Films Containing Organic Groups from Aqueous Solution of Alkoxides

Oh, Junrok, Imai, Hiroaki, Hirashima, Hiroshi, Tsukuma, Koji
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Volume:
12
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/JMR.1997.0141
Date:
April, 1997
File:
PDF, 240 KB
english, 1997
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