E-ALD of Cu Nanofilms on Ru/Ta Wafers Using Surface Limited...

Journal of The Electrochemical Society 2010 Vol. 157; Iss. 8

E-ALD of Cu Nanofilms on Ru/Ta Wafers Using Surface Limited Redox Replacement

Thambidurai, Chandru, Gebregziabiher, Daniel K., Liang, Xuehai, Zhang, Qinghui, Ivanova, Valentina, Haumesser, Paul-Henri, Stickney, John L.
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Volume:
157
Year:
2010
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.3454213
File:
PDF, 750 KB
english, 2010
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