![](/img/cover-not-exists.png)
Effects of Process and Gate Doping Species on Negative- Bias-Temperature Instability of p-Channel MOSFETs
Lee, Da-Yuan, Huang, Tiao-Yuan, Lin, Horng-Chih, Chiang, Wan-Ju, Huang, Guo-Wei, Wang, TahuiVolume:
151
Year:
2004
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1639168
File:
PDF, 415 KB
english, 2004