Electrochemical Cleaning of Post-Plasma Etch Fluorocarbon...

Electrochemical and Solid-State Letters 2004 Vol. 7; Iss. 12

Electrochemical Cleaning of Post-Plasma Etch Fluorocarbon Residues Using Reductive Radical Anion Chemistry

Timmons, Christopher L., Hess, Dennis W.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
7
Year:
2004
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.1813211
File:
PDF, 292 KB
english, 2004
Conversion to is in progress
Conversion to is failed