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Synthesis and characterisation of Hf(thd)2X2 derivatives [X = N(SiMe3)2, OSiMe3 and OSitBuMe2] as precursors for MOCVD of hafnium silicate films
Liliane G. Hubert-Pfalzgraf, Nadia Touati, Sergej V. Pasko, J. Vaissermann, Adulfas AbrutisVolume:
24
Year:
2005
Language:
english
Pages:
8
DOI:
10.1016/j.poly.2005.06.036
File:
PDF, 271 KB
english, 2005