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Ab initio Molecular Orbital Study on Hydrogen Radical Addition Reactions to Graphite Surface and Subsequent Initial Surface Process in Silane Plasma Chemical Vapor Deposition
Sato, Kota, Shinagawa, Eiji, Nakajima, Kenji, Miyazaki, Kaori, Koinuma, HideomiVolume:
42
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.42.7478
Date:
December, 2003
File:
PDF, 136 KB
english, 2003