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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Metrology, Inspection, and Process Control for Microlithography XXIX - Fast analytical modeling of SEM images at a high level of accuracy
Cain, Jason P., Sanchez, Martha I., Babin, S., Borisov, S. S., Trifonenkov, V. P.Volume:
9424
Year:
2015
Language:
english
DOI:
10.1117/12.2086072
File:
PDF, 780 KB
english, 2015