Straight and Smooth Etching of GaN (1\bar100) Plane by Combination of Reactive Ion Etching and KOH Wet Etching Techniques
Itoh, Morimichi, Kinoshita, Toru, Koike, Choshiro, Takeuchi, Misaichi, Kawasaki, Koji, Aoyagi, YoshinobuVolume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.3988
Date:
May, 2006
File:
PDF, 252 KB
english, 2006