On the Mechanism of Copper Oxide Reduction by Dielectric...

On the Mechanism of Copper Oxide Reduction by Dielectric Barrier Discharge Plasma Using H2 and Ar Mixture Gases

Xu, Zhi Jian, Qi, Bin, Di, Lan Bo
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Volume:
690-693
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/AMR.690-693.1664
Date:
May, 2013
File:
PDF, 349 KB
english, 2013
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