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[ECS 215th ECS Meeting - San Francisco, CA (May 24 - May 29, 2009)] ECS Transactions - Reduction of Scratch on Brush Scrubbing in Post CMP Cleaning by Analyzing Contact Kinetics on Ultra Low-k Dielectric
Gu, Xun, Nemoto, Takaneo, Teramoto, Akinobu, Ito, Takashi, Sugawa, Shigetoshi, Ohmi, TadahiroYear:
2009
Language:
english
DOI:
10.1149/1.3123779
File:
PDF, 324 KB
english, 2009