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Thermal Stability of ALD-HfO2∕GaAs Pretreated with Trimethylaluminium
Byun, Young-Chul, An, Chee-Hong, Lee, Seok-Hee, Cho, Mann-Ho, Kim, HyoungsubVolume:
159
Year:
2012
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/2.052201jes
File:
PDF, 321 KB
english, 2012