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A Less Critical Cleaning Procedure for Silicon Wafer Using Diluted HF Dip and Boiling in Isopropyl Alcohol as Final Steps
Filho, Sebastião Gomes dos SantosVolume:
142
Year:
1995
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2048555
File:
PDF, 751 KB
english, 1995