Estimation of HSQ Resist Profile by Using High Contrast...

Key Engineering Materials 2013 / 12 Vol. 596

Estimation of HSQ Resist Profile by Using High Contrast Developement Model for High Resolution EB Lithography

Zhang, Hui, Komori, Takuya, Liu, Jing, Zhang, Yu Long, bin Mohamad, Zulfakri, Yin, You, Hosaka, Sumio
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Volume:
596
Language:
english
Journal:
Key Engineering Materials
DOI:
10.4028/www.scientific.net/KEM.596.97
Date:
December, 2013
File:
PDF, 1.77 MB
english, 2013
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