Alicyclic photoresists for CO2-based next-generation...

Polymer 2006 Vol. 47; Iss. 11

Alicyclic photoresists for CO2-based next-generation microlithography: A tribute to James E. McGrath

Mary Kate Boggiano, David Vellenga, Ruben Carbonell, Valerie Sheares Ashby, Joseph M. DeSimone
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Volume:
47
Year:
2006
Language:
english
Pages:
6
DOI:
10.1016/j.polymer.2006.03.001
File:
PDF, 291 KB
english, 2006
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