Formation of Doping Profiles in Float Zone Silicon by...

MRS Proceedings 2008 / 1 Vol. 1108

Formation of Doping Profiles in Float Zone Silicon by Helium Implantation and Plasma Hydrogenation

Job, Reinhart, Niedernostheide, Franz-Josef, Schulze, Hans-Joachim, Schulze, Holger
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Volume:
1108
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/PROC-1108-A12-03
Date:
January, 2008
File:
PDF, 97 KB
english, 2008
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