Growth of AlN by the Chemical Vapor Reaction Process

Japanese Journal of Applied Physics 2005 / 2 Vol. 44; Iss. 2

Growth of AlN by the Chemical Vapor Reaction Process

Hashimoto, Tadao, Fujito, Kenji, Samonji, Katsuya, Speck, James S., Nakamura, Shuji
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.869
Date:
February, 2005
File:
PDF, 531 KB
english, 2005
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