Improvement of Contact Resistance between Ru Electrode and...

Improvement of Contact Resistance between Ru Electrode and TiN Barrier in Ru/Crystalline-Ta 2 O 5 /Ru Capacitor for 50 nm Dynamic Random Access Memory

Lim, HanJin, Chung, Suk-Jin, Lee, Kwang Hee, Lee, Jinil, Kim, Jin Yong, Yoo, Cha-Young, Kim, Sung-Tae, Chung, U-In, Moon, Joo-Tae
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Volume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.44.2225
Date:
April, 2005
File:
PDF, 290 KB
english, 2005
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