Characterization of InGaN/GaN Multiple Quantum Well Nanorods Fabricated by Plasma Etching with Self-Assembled Nickel Metal Nanomasks
Hsueh, Tao-Hung, Huang, Hung-Wen, Kao, Chih-Chiang, Chang, Ya-Hsien, Ou-Yang, Miao-Chia, Kuo, Hao-Chung, Wang, Shing-ChungVolume:
44
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/jjap.44.2661
Date:
April, 2005
File:
PDF, 144 KB
english, 2005