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Experimental determination of residual stress in silicon nitride diffusion bonds obtained by high-energy X-ray diffraction
M. Vila, M.L. Martínez, C. Prieto, P. Miranzo, M.I. Osendi, A. Terry, G. VaughanVolume:
148
Year:
2004
Language:
english
Pages:
4
DOI:
10.1016/j.powtec.2004.09.035
File:
PDF, 257 KB
english, 2004