Excimer laser-assisted etching of polysilicon at 193 nm
Armacost, M. D., Babu, S. V., Nguyen, S. V., Rembetski, J. F.Volume:
2
Language:
english
Journal:
Journal of Materials Research
DOI:
10.1557/JMR.1987.0895
Date:
December, 1987
File:
PDF, 834 KB
english, 1987