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Predictable Reactive Ion Etching of GaAs and AlGaAs in HCl∕Ar RF Discharges
Nordheden, K. J.Volume:
137
Year:
1990
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.2086533
File:
PDF, 965 KB
english, 1990