Role of boron in the structural and electronic properties of hydrogenated silicon films deposited by r.f. magnetron sputtering
Banerjee, Ratnabali, Bhattacharyya, T. K., Sharma, S. N., Batabyal, A. K., Barua, A. K., Banerjee, Dipali, Bhusari, D. M., Kshirsagar, S. T.Volume:
71
Language:
english
Journal:
Philosophical Magazine Part B
DOI:
10.1080/01418639508240300
Date:
February, 1995
File:
PDF, 1.11 MB
english, 1995