Plasma Characteristics Related to Thin-Film Microstructures in Unbalanced Magnetron Sputtering Processes
Rohde, S.L.Volume:
102-104
Year:
1992
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.102-104.563
File:
PDF, 751 KB
english, 1992