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Smooth and Vertical Profile Dry Etching of Si Using XeF 2 Plasma
Matsutani, Akihiro, Ohtsuki, Hideo, Koyama, FumioVolume:
48
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.48.06FE09
Date:
June, 2009
File:
PDF, 142 KB
english, 2009