Transformation of silica fume into chemical mechanical...

Powder Technology 2011 Vol. 205; Iss. 1-3

Transformation of silica fume into chemical mechanical polishing (CMP) nano-slurries for advanced semiconductor manufacturing

M.M. Rashad, M.M. Hessien, E.A. Abdel-Aal, K. El-Barawy, R.K. Singh
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Volume:
205
Year:
2011
Language:
english
Pages:
6
DOI:
10.1016/j.powtec.2010.09.005
File:
PDF, 1.23 MB
english, 2011
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