SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Advances in Patterning Materials and Processes XXXII - XAS photoresists electron/quantum yields study with synchrotron light
Wallow, Thomas I., Hohle, Christoph K., de Schepper, Peter, Vaglio Pret, Alessandro, Hansen, Terje, Giglia, Angelo, Hoshiko, Kenji, Mani, Antonio, Biafore, John J.Volume:
9425
Year:
2015
Language:
english
DOI:
10.1117/12.2085951
File:
PDF, 400 KB
english, 2015