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Influence of F[sup +] Co-Implants on EOR Defect Formation in B[sup +]-Implanted, Ultrashallow Junctions
Boninelli, S., Cristiano, F., Lerch, W., Paul, S., Cowern, N. E. B.Volume:
10
Year:
2007
Language:
english
Journal:
Electrochemical and Solid-State Letters
DOI:
10.1149/1.2751837
File:
PDF, 338 KB
english, 2007