Influence of Source/Drain Parasitic Resistance on Device Performance of Ultrathin Body III–V Channel Metal–Oxide–Semiconductor Field-Effect Transistors
Maegawa, Yōsuke, Koba, Shunsuke, Tsuchiya, Hideaki, Ogawa, MatsutoVolume:
4
Language:
english
Journal:
Applied Physics Express
DOI:
10.1143/APEX.4.084301
Date:
August, 2011
File:
PDF, 433 KB
english, 2011