Defect Study on Si Implanted with B and BF2 Ions by Coincidence Doppler Broadening Measurements
Akahane, Takashi, Fujinami, Masanori, Ohnishi, Keisuke, Sawada, TsuguoVolume:
363-365
Year:
2001
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.363-365.469
File:
PDF, 269 KB
2001